Particle Removal Mechanism in Ultrasonic Cleaning. Scrubbing Action by Resonant Bubbles.

Ultrasonic and Megasonic Particle Removal

Particulate surface contamination is one of the major causes of low yields in the semiconductor and other affected industries. The theory of low frequency (ultrasonic) and high frequency (megasonic) cleaning will be presented. Ultrasonic cleaning (less than 100 kHz) is relevant to cleaning of optics and precision parts. Megasonic cleaning (0.8 to 1.2 MHz) is used in semiconductor manufacturing....

Particle Motion and Stain Removal during Simulated Abrasive Tooth Cleaning

SUBSTITUTING FOR CFCs USED AS CLEANING AGENTS: (1) PARTICLE REMOVAL

Freon-TF is no better a cleaning fluid than deionized water for removing either organic (polystyrene latex spheres) or inorganic (glass beads) particles from silicon wafer surfaces, as shown by comparative measurements of cleaning efficiencies in both an ultrasonic bath and a hydrodynamic cleaning apparatus. A primary reason for this lackluster performance is the higher van der Waals’ forces of...

Efficacy of ultrasonic cleaning.

Resin blocks conta in ing s imula ted roo t canal spaces were c o m p a r e d with ext rac ted tee th as mode ls for measu r ing the eff ic iency of endodon t i c d e b r i d e m e n t with hand ins t rumenta t ion , u l t rasonica t ion , or a c o m b i n a t i o n of bo th techniques . Canal spaces were filled with r ad io i so tope l aden gelatin, and the loss of radioact iv i ty was measu r...

Removal of Volatile Iodine from Gas Bubbles Rising in Water Pools: Review and Assessment of Pool Scrubbing Codes

During a hypothetical nuclear reactor accident with core damage the fission products released from the degrading fuel bundles often pass through aqueous beds before entering the containment, mitigating in part the source term. Several computer codes have been developed for predicting the fission product and aerosols removal in pool scrubbing scenarios. In addition to particle removal, these cod...